Unit:
Διατμηματικό ΠΜΣ ΜικροηλεκτρονικήLibrary of the School of Science
Author:
Συκαράς Δημήτριος
Supervisors info:
Δ. Δαβάζογλου, Διευθυντής Ερευνών, ΙΜΗΛ, (Επιβλέπων) Μ. Βασιλοπούλου, Επιστημονικό Προσωπικό, ΙΜΗΛ, Α. Αραπογιάννη, Καθηγήτρια, ΕΚΠΑ
Original Title:
Δομικός και ηλεκτρικός χαρακτηρισμός μεταλλικών οξειδίων για εφαρμογή σε οπτοηλεκτρονικές διατάξεις
Summary:
The present master thesis refers to metal oxides thin films. In this the
deposition technologies in microelectronics are described and especially the
Physical Vapor Deposition (PVD) and the Chemical Vapor Deposition (CVD). There
is a review of thin films’ characterization methods. It also follows
description of organic optoelectronic devices, organic light emitting diodes
(OLEDs) and organic photovoltaics (OPVs), their operation principals and their
characterization. In addition the procedure of deposition thin films of
tungsten and molybdenum oxides, their applications and their characterization
are described. Finally the applications of tungsten and molybdenum, fully and
partially oxidized, thin films oxides in optoelectronic devices and their
characterization are presented.
Keywords:
Physical vapor deposition, Tungsten oxides thin films, Molybdenum oxides thin films, Organic light emitting diodes, Organic photovoltaics
Number of index pages:
17-23
Number of references:
115