Unit:
Department of ChemistryLibrary of the School of Science
Dissertation committee:
Μαργαρίτα Χατζηχρηστίδη, Αναπληρώτρια Καθηγήτρια, Τμήμα Χημείας, ΕΚΠΑ
Μαρία Βαμβακάκη, Καθηγήτρια, Τμήμα Επιστήμης και Τεχνολογίας Υλικών, Πανεπιστήμιο Κρήτης
Παναγιώτης Αργείτης, Ερευνητής Α', Ινστιτούτο Νανοεπιστήμης και Νανοτεχνολογίας, Ε.Κ.Ε.Φ.Ε. 'Δημόκριτος'
Ερμόλαος Ιατρού, Καθηγητής, Τμήμα Χημείας, ΕΚΠΑ
Μαρίνος Πιτσικάλης, Καθηγητής, Τμήμα Χημείας, ΕΚΠΑ
Ιωάννης Ράπτης, Ερευνητής Α', Ινστιτούτο Νανοεπιστήμης και Νανοτεχνολογίας, Ε.Κ.Ε.Φ.Ε. 'Δημόκριτος'
Μερόπη Σανοπούλου, Ερευνήτρια Α', Ινστιτούτο Νανοεπιστήμης και Νανοτεχνολογίας, Ε.Κ.Ε.Φ.Ε.'Δημόκριτος'
Original Title:
Πολυμερικά υλικά κατάλληλα για λιθογραφία μέσω φωτοκαθοδηγούμενων διεργασιών (top-down) και μέσω αυτο-οργάνωσης (bottom-up)
Translated title:
Polymeric materials suitable for lithography by top-down and bottom-up procedures
Summary:
In this thesis, the microsystems were developed, combining top-down and bottom-up lithography. The combination of these lithographic techniques created nanostructures (< 15 nm) with high resolution. Consequently, the amphiphilic poly(2-dimethylamino)ethyl methacrylate-b-poly(tetrahydropyranyl) methacrylate copolymers, denoted (PDMAEMA-b-PTHPMA) were synthesized by group transfer polymerization and the tertiary amine groups of PDMAEMA were quaternized using 1-(chloromethyl) naphthalene. Thin films of qPDMAEMA-b-PTHPMA copolymers in the presence of photoacid generator were developed via spin coating of copolymers solution on neutralized silicon substrates. A few regions of the films were exposed to 254 nm through a mask, causing the acidic hydrolysis of PTHPMA block. The smallest created structures had 500 nm line width. The unexposed regions of the samples were self-assembled through solvent annealing method in non-selective solvent, creating nanostructures. Moreover, at self-assembled areas the PTHPMA block was selectively removed by oxygen plasma etching, while the qPDMAEMA block has high etch resistance. The morphological results were evaluated by optical and atomic force microscopy.
Also, drop casting of qPDMAEMA-b-PTHPMA copolymers, qPDMAEMA and PBuMA homopolymers solutions on chemocapacitive sensor array were used to detect volatile organic compounds. The sensing layers of qPDMAEMA-b-PTHPMA copolymer and qPDMAEMA homopolymers were selective to polar and non-polar analytes and discriminated methanol and ethanol vapors.
In conclusion, it was attempted the development of polymeric materials and the process definition to combine two cutting-edge lithographic techniques in one system. Alternatively, these polymeric materials can be applicable in chemocapacitors, detecting volatile organic compounds.
Main subject category:
Science
Keywords:
block copolymer self-assembly, nanostructures, photolithography, group transfer polymerization, chemocapacitors
Number of index pages:
12
Number of references:
163
