Self-assembly of block copolymers and their application in bottom-up lithography

Postgraduate Thesis uoadl:1319053 120 Read counter

Unit:
Κατεύθυνση Επιστήμη Πολυμερών και Εφαρμογές της
Library of the School of Science
Deposit date:
2015-10-21
Year:
2015
Author:
Νίκα Αναστασία
Supervisors info:
Μαργαρίτα Χατζηχρηστίδη Επίκ. Καθηγήτρια
Original Title:
Μικροφασικός διαχωρισμός δισυσταδικών συμπολυμερών και χρήση τους στη bottom-up λιθογραφία
Languages:
Greek
Translated title:
Self-assembly of block copolymers and their application in bottom-up lithography
Summary:
Block copolymers have recently received much attention not only for the fact
that their components are in nano-scale size but also for the various natural
and mechanical properties that they present because of their self-organization
ability in various morphologies.
The aim of this thesis is the microphase separation of block copolymers, the
observation of nanostructures that have been made with microphase separation,
using atomic force microscopy and the study of lithographic ability that block
copolymers have.
The block copolymer, that has been used, is the quaternized
poly[(2-dimethylamino) ethyl methacrylate]-b-poly(2-tetrahydropyranyl
methacrylate) (qPDMAEMA-b-PTHPMA). It was synthesized through group transfer
polymerization and characterized with Nuclear Magnetic Resonance (NMR),
Size-Exclusion Chromatography (SEC) and Infrared Spectroscopy (IR). It is an
amphiphilic block copolymer, where the block of qPDMAEMA is hydrophilic but the
block of PTHPMA is hydrophobic.
Then, thin films of block copolymer solution were prepared with spin-coating
into silicon substrates covered with silicon dioxide or random copolymer
poly[(2-dimethylamino) ethyl methacrylate]-poly(2-tetrahydropyranyl
methacrylate) -poly(2-hydroxyethyl methacrylate) (qPDMAEMA-PTHPMA-PHEMA)
(primer). Upon solvent annealing, polymeric chains are subject to microphase
separation. The lamellar morphology was oriented perpendicular to the
substrate, which was covered with primer solution, when the lamellar morphology
was oriented parallel to the substrate, which was covered with silicon dioxide.
The morphologies that have been obtained, were detected with atomic force
microscopy. Moreover, the lithographic ability of block copolymer was studied.
Keywords:
Self-assembly, qPDMAEMA, PTHPMA, Group transfer polymerization, Lammellar morphology
Index:
Yes
Number of index pages:
13-18
Contains images:
Yes
Number of references:
101
Number of pages:
111

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