Electrical properties of nanostructured SiN films for MEMS capacitive switches

Επιστημονική δημοσίευση - Άρθρο Περιοδικού uoadl:3035802 6 Αναγνώσεις

Μονάδα:
Ερευνητικό υλικό ΕΚΠΑ
Τίτλος:
Electrical properties of nanostructured SiN films for MEMS capacitive switches
Γλώσσες Τεκμηρίου:
Αγγλικά
Περίληψη:
The electrical properties of gold nanorods nanostructured silicon nitride films are comprehensively investigated with the aid of metal-insulator-metal capacitors and RF MEMS capacitive switches. Different nanorod diameters and densities were grown on the bottom electrode and with orientation normal to dielectric film surface. A simple physical model, which does not take the effect of electric field fringing into account, was developed to describe both the DC and low frequency electrical properties. It has been shown that the nanorods distribution and dimensions determine the electrical properties as well as the dielectric charging phenomena of the nanostructured films. Finally, in MEMS switches it has been shown that the nanorods presence does not affect the capacitance variance nor the RF characteristics of the device. © 2016 IOP Publishing Ltd.
Έτος δημοσίευσης:
2017
Συγγραφείς:
Koutsoureli, M.
Xavier, S.
Michalas, L.
Lioutas, C.
Bansropun, S.
Papaioannou, G.
Ziaei, A.
Περιοδικό:
Journal of Micromechanics and Microengineering
Εκδότης:
INSTITUTE OF PHYSICS PUBLISHING
Τόμος:
27
Αριθμός / τεύχος:
1
Λέξεις-κλειδιά:
Dielectric films; Electric fields; Gold compounds; Metal insulator boundaries; Nanorods; Reliability; Silicon nitride, Dielectric charging; Electric field fringing; Low frequency electrical property; MEMS capacitive switch; Metal insulator metal capacitor (MIM); Nanostructured dielectrics; RF MEMS capacitive switches; Simple Physical Models, Electric switches
Επίσημο URL (Εκδότης):
DOI:
10.1088/0960-1317/27/1/014001
Το ψηφιακό υλικό του τεκμηρίου δεν είναι διαθέσιμο.